(Rambling thoughts)
As I read this, I recall decades back producing printed circuit boards using a photo-sensitive resist (from Kodak, in fact) and I assume photo polymerization was the basis of that. It wasn't particularly analog, lithograph films and line art were used as image masters. The film was contact printed with UV light on a substrate coated with the photo-resist. The substrate was then washed in solvent, leaving the pattern on the substrate, after which acids were used to etch the piece. Photo resists are still in use, especially in the semiconductor industry (where I believe they use Xrays as the shorter wavelengths allow higher resolution).
The idea of something homegrown sounds interesting, especially if there was a way to somehow introduce a porosity proportional to exposure that could produce a more analog result.
DaveT