Hello,
I have some Ansco 70 lith developer made up and will shortly make a copper sulphate bleach in order to try my hand at second-pass lith printing. As my reference, I'm planning to use a translation of Wolfgang Meorsch's document on the subject and which is available here: https://www.moersch-photochemie.de/wp-content/uploads/2023/03/2nd-pass-Basics-and-Papers.pdf
I have a doubt as to the dilution of the lith developer used for redevelopment. At the beginning of point 9 on the first page, there's the line: "Redeveloping: dilute your lith developer 10x – 30x stronger than you usually do". To me, this means that I should use less dilute solution than I do for direct lith printing. However, I'm wondering if this is correct, and that perhaps the text should read "10x-30x more dilute than you usually do". I say this because in the same paragraph there's the following: "The problem is, that the blacks come first, sometimes too fast. That´s why the developer should be weak". Am I right to think there's a mistake in the translation?
In the case of Ansco 70, I understand that for direct lith printing, after mixing part 1 and 2 together, the resultant solution should be diluted with water in the ratio of 1:23 to make the working solution (and adjusting the dilution from there, as required).
Can anyone suggest, please, a good dilution of Anso 70 in 2nd pass printing? ie. a good dilution of Anso 70 for redevelopment after the bleaching stage.
Thanks,
PS. This is the formula for Ansco which I took from the Unblinking Eye site:
Solution 1
Water at 125° F (52° C) 750 cc
Hydroquinone 25 g
Potassium metabisulfite 25 g
Potassium bromide 25 g
Cold water to make 1 liter
Solution 2
Cold water 1 liter
Sodium hydroxide* 36 g
* or Potassium hydroxide 50 g
I have some Ansco 70 lith developer made up and will shortly make a copper sulphate bleach in order to try my hand at second-pass lith printing. As my reference, I'm planning to use a translation of Wolfgang Meorsch's document on the subject and which is available here: https://www.moersch-photochemie.de/wp-content/uploads/2023/03/2nd-pass-Basics-and-Papers.pdf
I have a doubt as to the dilution of the lith developer used for redevelopment. At the beginning of point 9 on the first page, there's the line: "Redeveloping: dilute your lith developer 10x – 30x stronger than you usually do". To me, this means that I should use less dilute solution than I do for direct lith printing. However, I'm wondering if this is correct, and that perhaps the text should read "10x-30x more dilute than you usually do". I say this because in the same paragraph there's the following: "The problem is, that the blacks come first, sometimes too fast. That´s why the developer should be weak". Am I right to think there's a mistake in the translation?
In the case of Ansco 70, I understand that for direct lith printing, after mixing part 1 and 2 together, the resultant solution should be diluted with water in the ratio of 1:23 to make the working solution (and adjusting the dilution from there, as required).
Can anyone suggest, please, a good dilution of Anso 70 in 2nd pass printing? ie. a good dilution of Anso 70 for redevelopment after the bleaching stage.
Thanks,
PS. This is the formula for Ansco which I took from the Unblinking Eye site:
Solution 1
Water at 125° F (52° C) 750 cc
Hydroquinone 25 g
Potassium metabisulfite 25 g
Potassium bromide 25 g
Cold water to make 1 liter
Solution 2
Cold water 1 liter
Sodium hydroxide* 36 g
* or Potassium hydroxide 50 g